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The Review of Scientific Instruments|September 3, 2016
Simulations on time-of-flight ERDA spectrometer performanceJaakko Julin, Kai Arstila, Timo Sajavaara
Materials (Basel, Switzerland)|October 23, 2021
Tuning of Emission Wavelength of CaS:Eu by Addition of Oxygen Using Atomic Layer DepositionJosé Rosa, Jouko Lahtinen, Jaakko Julin, et al.
Chemistry of Materials : a Publication of the American Chemical Society|June 20, 2022
Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl ZincRamin Ghiyasi, Anish Philip, Ji Liu, et al.
Physical Chemistry Chemical Physics : PCCP|January 2, 2024
Enhancing electrocatalytic activity in metallic thin films through surface segregation of carbonAyesha Kousar, Ulviyya Quliyeva, Ishan Pande, et al.
ACS Applied Materials & Interfaces|August 16, 2018
Structural Properties of Al-O Monolayers in SiO2 on Silicon and the Maximization of Their Negative Fixed Charge DensityDaniel Hiller, Jörg Göttlicher, Ralph Steininger, et al.
Nature Chemistry|October 23, 2023
Droplet slipperiness despite surface heterogeneity at molecular scaleSakari Lepikko, Ygor Morais Jaques, Muhammad Junaid, et al.
Nature Communications|August 24, 2022
Strong absorption and ultrafast localisation in NaBiS2 nanocrystals with slow charge-carrier recombinationYi-Teng Huang, Seán R Kavanagh, Marcello Righetto, et al.
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