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ACS Nano|November 10, 2025
Crystallinity-Preserving Atomic Layer Etching of Ultrathin In2O3 for Stable Oxide NanoelectronicsMin Chan Kim, Hae Lin Yang, Ji Hyun Gwoen, et al.
ACS Applied Materials & Interfaces|June 22, 2026
Decoupling Moisture and Hydrogen Barrier Properties in Silicon Nitride Films Deposited by Plasma-Enhanced Atomic Layer Deposition at 100 °C via Precursor-Defined Bonding NetworksJi Min Kim, Tae-Kyung Kim, Hye-Jin Oh, et al.
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