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Materials (Basel, Switzerland)|February 13, 2020
A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nmJunjie Li, Yongliang Li, Na Zhou, et al.
Nanomaterials (Basel, Switzerland)|April 25, 2020
Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-TransistorsJunjie Li, Yongliang Li, Na Zhou, et al.
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