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L Hector

Showing results (81-90 of 101) with videos related to

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Langmuir : the ACS Journal of Surfaces and Colloids|February 8, 2022
Increasing the Diameter of Vertically Aligned, Hexagonally Ordered Pores in Mesoporous Silica Thin FilmsNabil A N Mohamed, Yisong Han, Andrew L Hector, et al.
Nanoscale Research Letters|November 4, 2015
Phase-Change Memory Properties of Electrodeposited Ge-Sb-Te Thin FilmRuomeng Huang, Gabriela P Kissling, Andrew Jolleys, et al.
Nanoscale Advances|June 16, 2023
Effects of surfactant head group modification on vertically oriented mesoporous silica produced by the electrochemically assisted surfactant assembly methodNabil A N Mohamed, Yisong Han, Sarah Harcourt-Vernon, et al.
Physical Chemistry Chemical Physics : PCCP|January 29, 2014
Electrodeposition from supercritical fluidsP N Bartlett, D A Cook, M W George, et al.
Dalton Transactions (Cambridge, England : 2003)|November 24, 2018
[Ge(Te<sup>n</sup>Bu)<sub>4</sub>] - a single source precursor for the chemical vapour deposition of germanium telluride thin filmsSamantha L Hawken, Ruomeng Huang, C H Kees de Groot, et al.
Nanoscale|November 16, 2022
3D-structured mesoporous silica memristors for neuromorphic switching and reservoir computingAyoub H Jaafar, Li Shao, Peng Dai, et al.
ACS Applied Materials & Interfaces|August 8, 2023
Combined Electrochemical, XPS, and STXM Study of Lithium Nitride as a Protective Coating for Lithium Metal and Lithium-Sulfur BatteriesSamuel D S Fitch, Gilles E Moehl, Nina Meddings, et al.
Chemsuschem|September 13, 2023
A Comparison of the Reactivity of the Lattice Nitrogen in Tungsten Substituted Co<sub>3</sub> Mo<sub>3</sub> N and Ni<sub>2</sub> Mo<sub>3</sub> NSamia Al Sobhi, Ihfaf AlShibane, C Richard A Catlow, et al.
Inorganic Chemistry|July 3, 2018
Covalency is Frustrating: La<sub>2</sub>Sn<sub>2</sub>O<sub>7</sub> and the Nature of Bonding in Pyrochlores under High Pressure-Temperature ConditionsChristian Childs, Keith V Lawler, Andrew L Hector, et al.
Chemistry of Materials : a Publication of the American Chemical Society|February 4, 2014
Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor DepositionSophie L Benjamin, C H Kees de Groot, Chitra Gurnani, et al.
Pageof 11

Showing results (81-90 of 101) with videos related to

Sort By:
Pageof 11
Langmuir : the ACS Journal of Surfaces and Colloids|February 8, 2022
Increasing the Diameter of Vertically Aligned, Hexagonally Ordered Pores in Mesoporous Silica Thin FilmsNabil A N Mohamed, Yisong Han, Andrew L Hector, et al.
Nanoscale Research Letters|November 4, 2015
Phase-Change Memory Properties of Electrodeposited Ge-Sb-Te Thin FilmRuomeng Huang, Gabriela P Kissling, Andrew Jolleys, et al.
Nanoscale Advances|June 16, 2023
Effects of surfactant head group modification on vertically oriented mesoporous silica produced by the electrochemically assisted surfactant assembly methodNabil A N Mohamed, Yisong Han, Sarah Harcourt-Vernon, et al.
Physical Chemistry Chemical Physics : PCCP|January 29, 2014
Electrodeposition from supercritical fluidsP N Bartlett, D A Cook, M W George, et al.
Dalton Transactions (Cambridge, England : 2003)|November 24, 2018
[Ge(Te<sup>n</sup>Bu)<sub>4</sub>] - a single source precursor for the chemical vapour deposition of germanium telluride thin filmsSamantha L Hawken, Ruomeng Huang, C H Kees de Groot, et al.
Nanoscale|November 16, 2022
3D-structured mesoporous silica memristors for neuromorphic switching and reservoir computingAyoub H Jaafar, Li Shao, Peng Dai, et al.
ACS Applied Materials & Interfaces|August 8, 2023
Combined Electrochemical, XPS, and STXM Study of Lithium Nitride as a Protective Coating for Lithium Metal and Lithium-Sulfur BatteriesSamuel D S Fitch, Gilles E Moehl, Nina Meddings, et al.
Chemsuschem|September 13, 2023
A Comparison of the Reactivity of the Lattice Nitrogen in Tungsten Substituted Co<sub>3</sub> Mo<sub>3</sub> N and Ni<sub>2</sub> Mo<sub>3</sub> NSamia Al Sobhi, Ihfaf AlShibane, C Richard A Catlow, et al.
Inorganic Chemistry|July 3, 2018
Covalency is Frustrating: La<sub>2</sub>Sn<sub>2</sub>O<sub>7</sub> and the Nature of Bonding in Pyrochlores under High Pressure-Temperature ConditionsChristian Childs, Keith V Lawler, Andrew L Hector, et al.
Chemistry of Materials : a Publication of the American Chemical Society|February 4, 2014
Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor DepositionSophie L Benjamin, C H Kees de Groot, Chitra Gurnani, et al.
Pageof 11