Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

L M Walpita

Showing results (1-10 of 6) with videos related to

Pageof 1
Sort By:
Applied Optics|May 22, 2010
Nonlinear electroabsorption cell for artificial neural networksL M Walpita
Applied Optics|October 1, 1984
Beam expansion in linear constant period gratingsL M Walpita, C W Pitt
Applied Optics|May 11, 2010
Simplified differential phase optical microscopeH Chung, L M Walpita, W S Chang
Applied Optics|June 12, 2010
Integrated-optic Mach-Zehnder rf phase comparatorL M Walpita, S C Wang, W S Chang
Applied Optics|May 5, 2010
Cross modulation of light in semiconductor materials in the presence of electric fieldsL M Walpita, W S Chang, H H Wieder, et al.
Applied Optics|May 1, 1986
Reactive ion beam etching of PLZT electrooptic substrates with repeated self-aligned maskingM A Title, L M Walpita, W X Chen, et al.
Pageof 1

Showing results (1-10 of 6) with videos related to

Sort By:
Pageof 1
Applied Optics|May 22, 2010
Nonlinear electroabsorption cell for artificial neural networksL M Walpita
Applied Optics|October 1, 1984
Beam expansion in linear constant period gratingsL M Walpita, C W Pitt
Applied Optics|May 11, 2010
Simplified differential phase optical microscopeH Chung, L M Walpita, W S Chang
Applied Optics|June 12, 2010
Integrated-optic Mach-Zehnder rf phase comparatorL M Walpita, S C Wang, W S Chang
Applied Optics|May 5, 2010
Cross modulation of light in semiconductor materials in the presence of electric fieldsL M Walpita, W S Chang, H H Wieder, et al.
Applied Optics|May 1, 1986
Reactive ion beam etching of PLZT electrooptic substrates with repeated self-aligned maskingM A Title, L M Walpita, W X Chen, et al.
Pageof 1