Showing results (1-10 of 250) with videos related to

Sort By:
Pageof 25
Nanotechnology|May 18, 2013
Collective behavior of block copolymer thin films within periodic topographical structuresM Perego, A Andreozzi, A Vellei, et al.
Nanotechnology|March 19, 2011
The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin filmsA Andreozzi, E Poliani, G Seguini, et al.
ACS Applied Materials & Interfaces|November 12, 2014
High aspect ratio PS-b-PMMA block copolymer masks for lithographic applicationsF Ferrarese Lupi, T J Giammaria, F G Volpe, et al.
Nanotechnology|July 16, 2013
Rapid thermal processing of self-assembling block copolymer thin filmsF Ferrarese Lupi, T J Giammaria, M Ceresoli, et al.
Nanoscale|October 28, 2017
Magnetization switching in high-density magnetic nanodots by a fine-tune sputtering process on a large-area diblock copolymer maskG Barrera, F Celegato, M Coïsson, et al.
Nanotechnology|July 29, 2011
The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer depositionA Andreozzi, L Lamagna, G Seguini, et al.
Nanotechnology|January 30, 2013
In-plane organization of silicon nanocrystals embedded in SiO2 thin filmsC Castro, S Schamm-Chardon, B Pecassou, et al.
Nanotechnology|September 26, 2015
Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperaturesM Ceresoli, M Palermo, F Ferrarese Lupi, et al.
Nanotechnology|July 22, 2017
Influence of block copolymer feature size on reactive ion etching pattern transfer into siliconM Dialameh, F Ferrarese Lupi, D Imbraguglio, et al.
Nanotechnology|December 25, 2009
Si nanocrystal synthesis in HfO2/SiO/HfO2 multilayer structuresM Perego, G Seguini, C Wiemer, et al.
Pageof 25