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M V Svechnikov

Showing results (1-10 of 7) with videos related to

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Optics Express|June 16, 2015
Resolving capacity of the circular Zernike polynomialsM V Svechnikov, N I Chkhalo, M N Toropov, et al.
Optics Letters|February 14, 2015
Application of point diffraction interferometry for middle spatial frequency roughness detectionM V Svechnikov, N I Chkhalo, M N Toropov, et al.
The Review of Scientific Instruments|July 3, 2015
Sub-micrometer resolution proximity X-ray microscope with digital image registrationN I Chkhalo, A E Pestov, N N Salashchenko, et al.
Optics Express|October 12, 2022
Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nmV N Polkovnikov, R A Shaposhnikov, S Yu Zuev, et al.
Applied Optics|November 13, 2015
Application of point diffraction interferometry for measuring angular displacement to a sensitivity of 0.01 arcsecD A Gavrilin, S V Kuzin, N N Salashchenko, et al.
The Review of Scientific Instruments|July 3, 2020
High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength rangesS A Garakhin, N I Chkhalo, I A Kas'kov, et al.
Optics Express|January 18, 2019
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithographyM V Svechnikov, N I Chkhalo, S A Gusev, et al.
Pageof 1

Showing results (1-10 of 7) with videos related to

Sort By:
Pageof 1
Optics Express|June 16, 2015
Resolving capacity of the circular Zernike polynomialsM V Svechnikov, N I Chkhalo, M N Toropov, et al.
Optics Letters|February 14, 2015
Application of point diffraction interferometry for middle spatial frequency roughness detectionM V Svechnikov, N I Chkhalo, M N Toropov, et al.
The Review of Scientific Instruments|July 3, 2015
Sub-micrometer resolution proximity X-ray microscope with digital image registrationN I Chkhalo, A E Pestov, N N Salashchenko, et al.
Optics Express|October 12, 2022
Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nmV N Polkovnikov, R A Shaposhnikov, S Yu Zuev, et al.
Applied Optics|November 13, 2015
Application of point diffraction interferometry for measuring angular displacement to a sensitivity of 0.01 arcsecD A Gavrilin, S V Kuzin, N N Salashchenko, et al.
The Review of Scientific Instruments|July 3, 2020
High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength rangesS A Garakhin, N I Chkhalo, I A Kas'kov, et al.
Optics Express|January 18, 2019
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithographyM V Svechnikov, N I Chkhalo, S A Gusev, et al.
Pageof 1