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Journal of Nanoscience and Nanotechnology|November 22, 2011
Atomically controlled processing in silicon-based CVD epitaxial growthJunichi Murota, Masao Sakuraba, Bernd Tillack
Frontiers in Computational Neuroscience|February 22, 2021
Computational Efficiency of a Modular Reservoir Network for Image RecognitionYifan Dai, Hideaki Yamamoto, Masao Sakuraba, et al.
Science and Technology of Advanced Materials|June 2, 2017
Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heatingMasao Sakuraba, Katsutoshi Sugawara, Takayuki Nosaka, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|April 18, 2018
Amphiphobic Septa Enhance the Mechanical Stability of Free-Standing Bilayer Lipid MembranesDaichi Yamaura, Daisuke Tadaki, Shun Araki, et al.
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