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Matthew T Shaw

Showing results (1-10 of 17) with videos related to

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Macromolecular Rapid Communications|July 4, 2017
Area Selective Polymer Brush DepositionCian Cummins, Matthew T Shaw, Michael A Morris
Journal of Colloid and Interface Science|March 28, 2015
Reduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEOTandra Ghoshal, Matthew T Shaw, Justin D Holmes, et al.
ACS Applied Materials & Interfaces|February 21, 2013
Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal processDipu Borah, Matthew T Shaw, Justin D Holmes, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 27, 2013
Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approachTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
Nanoscale|November 10, 2012
"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arraysTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
ACS Nano|May 27, 2021
Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask ApproachTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
Journal of Colloid and Interface Science|December 11, 2012
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditionsDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Soft Matter|June 1, 2016
Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealingTandra Ghoshal, Atul Chaudhari, Cian Cummins, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 1, 2013
Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systemsDipu Borah, Mustafa Ozmen, Sozaraj Rasappa, et al.
ACS Applied Materials & Interfaces|December 12, 2012
Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistryDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Pageof 2

Showing results (1-10 of 17) with videos related to

Sort By:
Pageof 2
Macromolecular Rapid Communications|July 4, 2017
Area Selective Polymer Brush DepositionCian Cummins, Matthew T Shaw, Michael A Morris
Journal of Colloid and Interface Science|March 28, 2015
Reduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEOTandra Ghoshal, Matthew T Shaw, Justin D Holmes, et al.
ACS Applied Materials & Interfaces|February 21, 2013
Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal processDipu Borah, Matthew T Shaw, Justin D Holmes, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 27, 2013
Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approachTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
Nanoscale|November 10, 2012
"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arraysTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
ACS Nano|May 27, 2021
Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask ApproachTandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T Shaw, et al.
Journal of Colloid and Interface Science|December 11, 2012
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditionsDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Soft Matter|June 1, 2016
Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealingTandra Ghoshal, Atul Chaudhari, Cian Cummins, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 1, 2013
Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systemsDipu Borah, Mustafa Ozmen, Sozaraj Rasappa, et al.
ACS Applied Materials & Interfaces|December 12, 2012
Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistryDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Pageof 2