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Physical Chemistry Chemical Physics : PCCP|February 19, 2011
Reactivity of sub 1 nm supported clusters: (TiO2)n clusters supported on rutile TiO2 (110)Anna Iwaszuk, Michael NolanThe Veterinary Clinics of North America. Small Animal Practice|August 13, 2017
Management of Radiation Side Effects to the SkinTracy Gieger, Michael NolanJournal of Psychiatric and Mental Health Nursing|March 3, 2019
Delivering family psychoeducation at the mental health acute inpatient service: A practitioner narrativeMichael Nolan, Melissa PetrakisThe Journal of Chemical Physics|October 18, 2006
Hole localization in Al doped silica: A DFT + U descriptionMichael Nolan, Graeme W WatsonThe Journal of Physical Chemistry. B|August 18, 2006
The surface dependence of CO adsorption on CeriaMichael Nolan, Graeme W WatsonJournal of Physics. Condensed Matter : an Institute of Physics Journal|July 27, 2017
Non-classical behaviour of higher valence dopants in chromium (III) oxide by a Cr vacancy compensation mechanismJohn J Carey, Michael NolanBeilstein Journal of Nanotechnology|March 17, 2020
DFT calculations of the structure and stability of copper clusters on MoS<sub>2</sub>Cara-Lena Nies, Michael NolanNanotechnology|December 19, 2025
A first-principles study of the reactivity and layer-dependent properties of phosphoreneSaba Abdul Shakoor, Michael NolanBeilstein Journal of Nanotechnology|August 6, 2021
Prediction of Co and Ru nanocluster morphology on 2D MoS<sub>2</sub> from interaction energiesCara-Lena Nies, Michael NolanACS Applied Materials & Interfaces|June 11, 2014
Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitrideCiaran A Murray, Simon D Elliott, Dennis Hausmann, et al.Pageof 14