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Nanoscale|August 12, 2024
Extreme ultraviolet lithography reaches 5 nm resolutionIason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber, et al.
ACS Applied Materials & Interfaces|October 20, 2021
Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet LithographyLianjia Wu, Michiel F Hilbers, Olivier Lugier, et al.
ACS Materials Au|March 1, 2023
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography PerformanceNeha Thakur, Michaela Vockenhuber, Yasin Ekinci, et al.
ACS Applied Materials & Interfaces|December 29, 2022
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm NanolithographyZhihao Wang, Jinping Chen, Tianjun Yu, et al.
Small Methods|June 20, 2023
Theoretical Insights into the Solubility Polarity Switch of Metal-Organic Nanoclusters for Nanoscale PatterningQianqian Wang, Michaela Vockenhuber, Hao Cui, et al.
ACS Nano|August 20, 2024
Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)Mohammad S M Saifullah, Anil Kumar Rajak, Kevin A Hofhuis, et al.
Journal of the American Chemical Society|October 19, 2023
Charge Shielding-Oriented Design of Zinc-Based Nanoparticle Liquids for Controlled NanofabricationPeipei Tao, Qianqian Wang, Michaela Vockenhuber, et al.
ACS Omega|August 29, 2022
Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced LithographyYake Wang, Jinping Chen, Yi Zeng, et al.
ACS Applied Materials & Interfaces|August 5, 2024
Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate CounteranionsQuentin Evrard, Najmeh Sadegh, Simon Mathew, et al.
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