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Nadine Geyer

Showing results (1-10 of 8) with videos related to

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Nanoscale Research Letters|June 30, 2011
Quasi-radial growth of metal tube on si nanowires templateZhipeng Huang, Lifeng Liu, Nadine Geyer
Optics Letters|June 17, 2009
Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterningJohannes de Boor, Nadine Geyer, Ulrich Gösele, et al.
ACS Applied Materials & Interfaces|May 3, 2013
Ag-mediated charge transport during metal-assisted chemical etching of silicon nanowiresNadine Geyer, Bodo Fuhrmann, Hartmut S Leipner, et al.
Advanced Materials (Deerfield Beach, Fla.)|September 23, 2010
Metal-assisted chemical etching of silicon: a reviewZhipeng Huang, Nadine Geyer, Peter Werner, et al.
Nanotechnology|January 30, 2010
Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etchingJohannes de Boor, Nadine Geyer, Jörg V Wittemann, et al.
Nano Letters|June 2, 2009
Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directionsZhipeng Huang, Tomohiro Shimizu, Stephan Senz, et al.
Nanotechnology|May 27, 2015
Influence of the doping level on the porosity of silicon nanowires prepared by metal-assisted chemical etchingNadine Geyer, Nicole Wollschläger, Bodo Fuhrmann, et al.
Nano Letters|August 7, 2009
Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etchingNadine Geyer, Zhipeng Huang, Bodo Fuhrmann, et al.
Pageof 1

Showing results (1-10 of 8) with videos related to

Sort By:
Pageof 1
Nanoscale Research Letters|June 30, 2011
Quasi-radial growth of metal tube on si nanowires templateZhipeng Huang, Lifeng Liu, Nadine Geyer
Optics Letters|June 17, 2009
Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterningJohannes de Boor, Nadine Geyer, Ulrich Gösele, et al.
ACS Applied Materials & Interfaces|May 3, 2013
Ag-mediated charge transport during metal-assisted chemical etching of silicon nanowiresNadine Geyer, Bodo Fuhrmann, Hartmut S Leipner, et al.
Advanced Materials (Deerfield Beach, Fla.)|September 23, 2010
Metal-assisted chemical etching of silicon: a reviewZhipeng Huang, Nadine Geyer, Peter Werner, et al.
Nanotechnology|January 30, 2010
Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etchingJohannes de Boor, Nadine Geyer, Jörg V Wittemann, et al.
Nano Letters|June 2, 2009
Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directionsZhipeng Huang, Tomohiro Shimizu, Stephan Senz, et al.
Nanotechnology|May 27, 2015
Influence of the doping level on the porosity of silicon nanowires prepared by metal-assisted chemical etchingNadine Geyer, Nicole Wollschläger, Bodo Fuhrmann, et al.
Nano Letters|August 7, 2009
Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etchingNadine Geyer, Zhipeng Huang, Bodo Fuhrmann, et al.
Pageof 1