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Dalton Transactions (Cambridge, England : 2003)|March 10, 2021
Multi-metal coordination polymers grown through hybrid molecular layer depositionNathaniel E Richey, Shirin Borhan, Stacey F BentThe Journal of Chemical Physics|February 3, 2020
Understanding chemical and physical mechanisms in atomic layer depositionNathaniel E Richey, Camila de Paula, Stacey F BentJournal of Materials Chemistry. C|May 17, 2024
Aerosol-Assisted Chemical Vapor Deposition of 2H-WS2 From Single-Source Tungsten Dithiolene PrecursorsIan Germaine, Nathaniel E Richey, Mary B Huttel, et al.Chemical Communications (Cambridge, England)|June 9, 2017
Aerosol-assisted chemical vapor deposition of WS2 from the single source precursor WS(S2)(S2CNEt2)2Nathaniel E Richey, Chandler Haines, Jessica L Tami, et al.ACS Applied Materials & Interfaces|June 2, 2022
Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam ResistJingwei Shi, Ajay Ravi, Nathaniel E Richey, et al.Dalton Transactions (Cambridge, England : 2003)|February 8, 2018
N,N-Disubstituted-N'-acylthioureas as modular ligands for deposition of transition metal sulfidesZahra Ali, Nathaniel E Richey, Duane C Bock, et al.ACS Nano|March 25, 2015
Universal Length Dependence of Rod-to-Seed Exciton Localization Efficiency in Type I and Quasi-Type II CdSe@CdS NanorodsKaifeng Wu, Lawrence J Hill, Jinquan Chen, et al.European Journal of Inorganic Chemistry|August 31, 2019
Synthesis and Characterization of Tungsten Nitrido Amido Guanidinato Complexes as Precursors for Chemical Vapor Deposition of WNxCy Thin FilmsMichelle M Nolan, Alexander J Touchton, Nathaniel E Richey, et al.Journal of the American Chemical Society|June 8, 2022
Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)Cl3- and Al(CH2)3 PrecursorsIl-Kwon Oh, Tania E Sandoval, Tzu-Ling Liu, et al.ACS Nano|March 21, 2014
Colloidal polymers from dipolar assembly of cobalt-tipped CdSe@CdS nanorodsLawrence J Hill, Nathaniel E Richey, Younghun Sung, et al.Pageof 2