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Nicholas C Strandwitz

Showing results (1-10 of 18) with videos related to

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ACS Applied Electronic Materials|March 4, 2024
Dependence of the Metal-Insulator-Semiconductor Schottky Barrier Height on Insulator CompositionBenjamin E Davis, Nicholas C Strandwitz
Langmuir : the ACS Journal of Surfaces and Colloids|January 26, 2017
Byproduct-Free Route to Aminosiloxane Monolayers on Silicon/Silicon DioxideKiran Khadka, Nicholas C Strandwitz, Gregory S Ferguson
ACS Applied Materials & Interfaces|June 25, 2015
Chemical Stability of Titania and Alumina Thin Films Formed by Atomic Layer DepositionGabriela C Correa, Bo Bao, Nicholas C Strandwitz
The Review of Scientific Instruments|November 11, 2024
Design of an atomic layer deposition system with in situ reflection high energy electron diffractionAlexandra J Howzen, Justin Caspar, Alparslan Oztekin, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|March 25, 2010
In situ photopolymerization of pyrrole in mesoporous TiO2Nicholas C Strandwitz, Yoshiyuki Nonoguchi, Shannon W Boettcher, et al.
Science (New York, N.Y.)|April 2, 2011
Electrochemically mediated atom transfer radical polymerizationAndrew J D Magenau, Nicholas C Strandwitz, Armando Gennaro, et al.
Nature Materials|June 26, 2007
Tunable electronic interfaces between bulk semiconductors and ligand-stabilized nanoparticle assembliesShannon W Boettcher, Nicholas C Strandwitz, Martin Schierhorn, et al.
Nano Letters|September 2, 2008
Ionic ligand mediated electrochemical charging of gold nanoparticle assembliesShannon W Boettcher, Sebastian A Berg, Martin Schierhorn, et al.
ACS Applied Nano Materials|February 6, 2023
High-Sensitivity Low-Energy Ion Spectroscopy with Sub-Nanometer Depth Resolution Reveals Oxidation Resistance of MoS<sub>2</sub> Increases with Film Density and Shear-Induced Nanostructural Modifications of the SurfaceTomas F Babuska, John F Curry, Ryan Thorpe, et al.
The Journal of Physical Chemistry Letters|August 12, 2015
Use of Mixed CH3-/HC(O)CH2CH2-Si(111) Functionality to Control Interfacial Chemical and Electronic Properties During the Atomic-Layer Deposition of Ultrathin Oxides on Si(111)Leslie E O'Leary, Nicholas C Strandwitz, Christopher W Roske, et al.
Pageof 2

Showing results (1-10 of 18) with videos related to

Sort By:
Pageof 2
ACS Applied Electronic Materials|March 4, 2024
Dependence of the Metal-Insulator-Semiconductor Schottky Barrier Height on Insulator CompositionBenjamin E Davis, Nicholas C Strandwitz
Langmuir : the ACS Journal of Surfaces and Colloids|January 26, 2017
Byproduct-Free Route to Aminosiloxane Monolayers on Silicon/Silicon DioxideKiran Khadka, Nicholas C Strandwitz, Gregory S Ferguson
ACS Applied Materials & Interfaces|June 25, 2015
Chemical Stability of Titania and Alumina Thin Films Formed by Atomic Layer DepositionGabriela C Correa, Bo Bao, Nicholas C Strandwitz
The Review of Scientific Instruments|November 11, 2024
Design of an atomic layer deposition system with in situ reflection high energy electron diffractionAlexandra J Howzen, Justin Caspar, Alparslan Oztekin, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|March 25, 2010
In situ photopolymerization of pyrrole in mesoporous TiO2Nicholas C Strandwitz, Yoshiyuki Nonoguchi, Shannon W Boettcher, et al.
Science (New York, N.Y.)|April 2, 2011
Electrochemically mediated atom transfer radical polymerizationAndrew J D Magenau, Nicholas C Strandwitz, Armando Gennaro, et al.
Nature Materials|June 26, 2007
Tunable electronic interfaces between bulk semiconductors and ligand-stabilized nanoparticle assembliesShannon W Boettcher, Nicholas C Strandwitz, Martin Schierhorn, et al.
Nano Letters|September 2, 2008
Ionic ligand mediated electrochemical charging of gold nanoparticle assembliesShannon W Boettcher, Sebastian A Berg, Martin Schierhorn, et al.
ACS Applied Nano Materials|February 6, 2023
High-Sensitivity Low-Energy Ion Spectroscopy with Sub-Nanometer Depth Resolution Reveals Oxidation Resistance of MoS<sub>2</sub> Increases with Film Density and Shear-Induced Nanostructural Modifications of the SurfaceTomas F Babuska, John F Curry, Ryan Thorpe, et al.
The Journal of Physical Chemistry Letters|August 12, 2015
Use of Mixed CH3-/HC(O)CH2CH2-Si(111) Functionality to Control Interfacial Chemical and Electronic Properties During the Atomic-Layer Deposition of Ultrathin Oxides on Si(111)Leslie E O'Leary, Nicholas C Strandwitz, Christopher W Roske, et al.
Pageof 2