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Optics Express|December 19, 2025
Design of an extreme ultraviolet lithography objective system based on off-axis conic surfaces including a starting point and visualized full-field aberration correctionYutong Zou, Qun Yuan, Zhenyan Guo, et al.
Optics Express|November 14, 2024
Active-compensation of systematic error for the 1000 mm aperture flat interferometerNingyan Xu, Zhishan Gao, Qun Yuan, et al.
Optics Express|September 23, 2025
Starting-point design method for unobscured four-mirror reflective imagers based on multi-aberration evaluationNingyan Xu, Qun Yuan, Zhenyan Guo, et al.
Optics Express|September 13, 2019
Construction method through multiple off-axis parabolic surfaces expansion and mixing to design an easy-aligned freeform spectrometerLu Chen, Zhishan Gao, Jingfei Ye, et al.
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