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Oskar Baumgartner

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Solid-State Electronics|April 9, 2013
Subband engineering in <i>n</i>-type silicon nanowires using strain and confinementZlatan Stanojević, Viktor Sverdlov, Oskar Baumgartner, et al.
Micromachines|March 29, 2023
Effect of Mask Geometry Variation on Plasma Etching ProfilesJosip Bobinac, Tobias Reiter, Julius Piso, et al.
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Showing results (1-10 of 2) with videos related to

Sort By:
Pageof 1
Solid-State Electronics|April 9, 2013
Subband engineering in <i>n</i>-type silicon nanowires using strain and confinementZlatan Stanojević, Viktor Sverdlov, Oskar Baumgartner, et al.
Micromachines|March 29, 2023
Effect of Mask Geometry Variation on Plasma Etching ProfilesJosip Bobinac, Tobias Reiter, Julius Piso, et al.
Pageof 1