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Applied Optics|March 18, 2008
Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithographyP B Mirkarimi, S Bajt, M A WallApplied Optics|March 22, 2008
Recovery of Multilayer-Coated Zerodur and ULE Optics for Extreme-Ultraviolet Lithography by Recoating, Reactive-Ion Etching, and Wet-Chemical ProcessesP B Mirkarimi, S L Baker, C Montcalm, et al.Applied Optics|October 20, 2015
Impact of laser-contaminant interaction on the performance of the protective capping layer of 1 ω high-reflection mirror coatingsS R Qiu, M A Norton, R N Raman, et al.Journal of Nanoscience and Nanotechnology|April 1, 2006
A silicon-based, sequential coat-and-etch process to fabricate nearly perfect substrate surfacesP B Mirkarimi, E Spiller, S L Baker, et al.The Review of Scientific Instruments|October 3, 2014
A geophysical shock and air blast simulator at the National Ignition FacilityK B Fournier, C G Brown, M J May, et al.Pageof 1