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Scientific Reports|January 12, 2021
Mechanism understanding in cryo atomic layer etching of SiO2 based upon C4F8 physisorptionG Antoun, T Tillocher, P Lefaucheux, et al.
Scientific Reports|February 1, 2018
Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above -50 °CR Chanson, L Zhang, S Naumov, et al.
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