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Nanotechnology|March 19, 2019
Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditionsA Hadley, C Notthoff, P Mota-Santiago, et al.
Journal of Synchrotron Radiation|July 28, 2026
Ultrafast time-resolved small-angle X-ray scattering setup on the FemtoMAX beamlineJ C Ekström, P Mota-Santiago, F Engelmann, et al.
Nanotechnology|February 1, 2018
Nanoscale density variations induced by high energy heavy ions in amorphous silicon nitride and silicon dioxideP Mota-Santiago, H Vazquez, T Bierschenk, et al.
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