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Nanotechnology|October 22, 2013
Improving feature size uniformity from interference lithography systems with non-uniform intensity profilesEn-Chiang Chang, David Mikolas, Pao-Te Lin, et al.Journal of Synchrotron Radiation|May 4, 2016
Sapphire hard X-ray Fabry-Perot resonators for synchrotron experimentsYi Wei Tsai, Yu Hsin Wu, Ying Yi Chang, et al.Pageof 1