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Optics Express|June 6, 2019
Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure fieldTie Li, Yiyu Sun, Enze Li, et al.Applied Optics|November 22, 2021
Exposure latitude aware source and mask optimization for extreme ultraviolet lithographyLulu Zou, Yiyu Sun, Pengzhi Wei, et al.Applied Optics|February 24, 2022
Sampling-based imaging model for fast source and mask optimization in immersion lithographyYiyu Sun, Yanqiu Li, Guanghui Liao, et al.Applied Optics|November 22, 2021
Vectorial pupil optimization to compensate for a polarization effect at full exposure field in lithographyMiao Yuan, Yiyu Sun, Pengzhi Wei, et al.Atmospheric Pollution Research|February 23, 2023
Spatial interpolation of regional PM<sub>2.5</sub> concentrations in China during COVID-19 incorporating multivariate dataPengzhi Wei, Shaofeng Xie, Liangke Huang, et al.Optics Express|June 29, 2023
Effective multi-objective inverse lithography technology at full-field and full-chip levels with a hybrid dynamic priority algorithmPengzhi Wei, Yanqiu Li, Zhaoxuan Li, et al.Pageof 2