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Raoul Kirner

Showing results (1-10 of 5) with videos related to

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Applied Optics|February 7, 2012
Speckle orientation in paraxial optical systemsDayan Li, Damien P Kelly, Raoul Kirner, et al.
Optics Express|March 17, 2019
Improvements on the uniformity of large-area microlens arrays in Fused SilicaRaoul Kirner, Jeremy Béguelin, Martin Eisner, et al.
Optics Express|November 6, 2019
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithographyAndreas Vetter, Chen Yan, Raoul Kirner, et al.
Optics Express|August 23, 2018
Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light sourceAndreas Vetter, Raoul Kirner, Dmitrijs Opalevs, et al.
Optics Express|February 7, 2018
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nmRaoul Kirner, Andreas Vetter, Dmitrijs Opalevs, et al.
Pageof 1

Showing results (1-10 of 5) with videos related to

Sort By:
Pageof 1
Applied Optics|February 7, 2012
Speckle orientation in paraxial optical systemsDayan Li, Damien P Kelly, Raoul Kirner, et al.
Optics Express|March 17, 2019
Improvements on the uniformity of large-area microlens arrays in Fused SilicaRaoul Kirner, Jeremy Béguelin, Martin Eisner, et al.
Optics Express|November 6, 2019
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithographyAndreas Vetter, Chen Yan, Raoul Kirner, et al.
Optics Express|August 23, 2018
Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light sourceAndreas Vetter, Raoul Kirner, Dmitrijs Opalevs, et al.
Optics Express|February 7, 2018
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nmRaoul Kirner, Andreas Vetter, Dmitrijs Opalevs, et al.
Pageof 1