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Applied Optics|March 10, 2021
Strong second-harmonic response from semiconductor-dielectric interfacesMariusz Zdanowicz, Robert Mroczyński, Paweł Szczepański
Materials (Basel, Switzerland)|August 10, 2017
Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin FilmsMateusz Śmietana, Robert Mroczyński, Norbert Kwietniewski
Materials (Basel, Switzerland)|August 14, 2025
Analog Resistive Switching Phenomena in Titanium Oxide Thin-Film Memristive DevicesKarimul Islam, Rezwana Sultana, Robert Mroczyński
Nanomaterials (Basel, Switzerland)|December 2, 2020
Silicon-Carbide (SiC) Nanocrystal Technology and Characterization and Its Applications in Memory StructuresAndrzej Mazurak, Robert Mroczyński, David Beke, et al.
Materials (Basel, Switzerland)|September 13, 2025
The Influence of the Ar/N2 Ratio During Reactive Magnetron Sputtering of TiN Electrodes on the Resistive Switching Behavior of MIM DevicesPiotr Jeżak, Aleksandra Seweryn, Marcin Klepka, et al.
Materials (Basel, Switzerland)|December 10, 2021
Refractive Index of Heavily Germanium-Doped Gallium Nitride Measured by Spectral Reflectometry and EllipsometryDario Schiavon, Robert Mroczyński, Anna Kafar, et al.
Materials (Basel, Switzerland)|March 29, 2023
Studies of Electrical Parameters and Thermal Stability of HiPIMS Hafnium Oxynitride (HfOxNy) Thin FilmsMirosław Puźniak, Wojciech Gajewski, Aleksandra Seweryn, et al.
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