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Ryutaro Suda

Showing results (1-10 of 6) with videos related to

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Optics Letters|August 1, 2022
Incoherent computer-generated holographyRyutaro Suda, Makoto Naruse, Ryoichi Horisaki
Optics Letters|September 15, 2022
Incoherent computer-generated holography: publisher's noteRyutaro Suda, Makoto Naruse, Ryoichi Horisaki
Optics Letters|April 14, 2023
Double-sided computer-generated holographyRyutaro Suda, Yohei Nishizaki, Makoto Naruse, et al.
Journal of Nanoscience and Nanotechnology|May 8, 2013
Formation scheme of quantum point contacts based on nanogaps using field-emission-induced electromigrationRyutaro Suda, Mamiko Yagi, Takato Watanabe, et al.
Small Methods|November 22, 2025
Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO<sub>2</sub> and SiNShih-Nan Hsiao, Makoto Sekine, Ryutaro Suda, et al.
Small Methods|June 2, 2024
Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO<sub>2</sub> by Cryogenic-Assisted Surface ReactionsShih-Nan Hsiao, Makoto Sekine, Nikolay Britun, et al.
Pageof 1

Showing results (1-10 of 6) with videos related to

Sort By:
Pageof 1
Optics Letters|August 1, 2022
Incoherent computer-generated holographyRyutaro Suda, Makoto Naruse, Ryoichi Horisaki
Optics Letters|September 15, 2022
Incoherent computer-generated holography: publisher's noteRyutaro Suda, Makoto Naruse, Ryoichi Horisaki
Optics Letters|April 14, 2023
Double-sided computer-generated holographyRyutaro Suda, Yohei Nishizaki, Makoto Naruse, et al.
Journal of Nanoscience and Nanotechnology|May 8, 2013
Formation scheme of quantum point contacts based on nanogaps using field-emission-induced electromigrationRyutaro Suda, Mamiko Yagi, Takato Watanabe, et al.
Small Methods|November 22, 2025
Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO<sub>2</sub> and SiNShih-Nan Hsiao, Makoto Sekine, Ryutaro Suda, et al.
Small Methods|June 2, 2024
Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO<sub>2</sub> by Cryogenic-Assisted Surface ReactionsShih-Nan Hsiao, Makoto Sekine, Nikolay Britun, et al.
Pageof 1