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Sébastien Cavalaglio

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Nanoscale Advances|November 21, 2024
Substrate softness increases magnetic microdiscs-induced cytotoxicityAndrea Visonà, Sébastien Cavalaglio, Sébastien Labau, et al.
ACS Applied Materials & Interfaces|October 12, 2021
Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block CopolymersGwenaelle Pound-Lana, Philippe Bézard, Camille Petit-Etienne, et al.
ACS Applied Materials & Interfaces|May 17, 2024
Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block CopolymersAchmad Fajar Putranto, Camille Petit-Etienne, Sébastien Cavalaglio, et al.
Nanotechnology|January 19, 2023
Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithographyXavier Chevalier, Gwenaelle Pound-Lana, Cindy Gomes Correia, et al.
Pageof 1

Showing results (1-10 of 4) with videos related to

Sort By:
Pageof 1
Nanoscale Advances|November 21, 2024
Substrate softness increases magnetic microdiscs-induced cytotoxicityAndrea Visonà, Sébastien Cavalaglio, Sébastien Labau, et al.
ACS Applied Materials & Interfaces|October 12, 2021
Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block CopolymersGwenaelle Pound-Lana, Philippe Bézard, Camille Petit-Etienne, et al.
ACS Applied Materials & Interfaces|May 17, 2024
Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block CopolymersAchmad Fajar Putranto, Camille Petit-Etienne, Sébastien Cavalaglio, et al.
Nanotechnology|January 19, 2023
Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithographyXavier Chevalier, Gwenaelle Pound-Lana, Cindy Gomes Correia, et al.
Pageof 1