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Sebastian Engelmann

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The Journal of Chemical Physics|February 10, 2017
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C<sub>4</sub>F<sub>8</sub> and Ar/CHF<sub>3</sub> plasmaDominik Metzler, Chen Li, Sebastian Engelmann, et al.
Science Advances|August 29, 2018
Experimental realization of deep-subwavelength confinement in dielectric optical resonatorsShuren Hu, Marwan Khater, Rafael Salas-Montiel, et al.
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Showing results (1-10 of 2) with videos related to

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Pageof 1
The Journal of Chemical Physics|February 10, 2017
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C<sub>4</sub>F<sub>8</sub> and Ar/CHF<sub>3</sub> plasmaDominik Metzler, Chen Li, Sebastian Engelmann, et al.
Science Advances|August 29, 2018
Experimental realization of deep-subwavelength confinement in dielectric optical resonatorsShuren Hu, Marwan Khater, Rafael Salas-Montiel, et al.
Pageof 1