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Nanotechnology|August 23, 2021
Electron beam lithography with negative tone resist for highly integrated silicon quantum bitsKimihiko Kato, Yongxun Liu, Shigenori Murakami, et al.
Scientific Reports|October 9, 2021
4.2 K sensitivity-tunable radio frequency reflectometry of a physically defined p-channel silicon quantum dotSinan Bugu, Shimpei Nishiyama, Kimihiko Kato, et al.
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