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Nanomaterials (Basel, Switzerland)|December 23, 2022
Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-ControlledWon-Nyoung Jeong, Young-Seok Lee, Chul-Hee Cho, et al.
Journal of Nanoscience and Nanotechnology|January 6, 2021
Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co(Cp)₂)/NH₃Won Gyun Yeom, Chang Hoon Song, Chul Hee Cho, et al.
Sensors (Basel, Switzerland)|February 15, 2022
Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff ProbeSi-Jun Kim, Jang-Jae Lee, Young-Seok Lee, et al.
The Review of Scientific Instruments|February 4, 2012
Cutoff probe using Fourier analysis for electron density measurementByung-Keun Na, Kwang-Ho You, Dae-Woong Kim, et al.
Sensors (Basel, Switzerland)|November 25, 2023
On Encapsulated Dielectric Barrier Discharge Plasma Sources for Radar Cross Section Reduction in Mobile EnvironmentsMinsu Choi, Shin-Jae You, Jinwoo Jung, et al.
ACS Omega|September 18, 2023
Role of Oxygen in Amorphous Carbon Hard Mask Plasma EtchingHee-Jung Yeom, Min Young Yoon, Daehan Choi, et al.
Advanced Science (Weinheim, Baden-Wurttemberg, Germany)|April 6, 2018
Impact of Plasma Electron Flux on Plasma Damage-Free Sputtering of Ultrathin Tin-Doped Indium Oxide Contact Layer on p-GaN for InGaN/GaN Light-Emitting DiodesKwang Jeong Son, Tae Kyoung Kim, Yu-Jung Cha, et al.
Scientific Reports|April 6, 2026
Revealing the transient ionization dynamics and mode-coupling mechanisms of helicon discharge through a self-consistent multiphysics modelJing-Jing Ma, Lei Chang, Ming-Yang Wu, et al.
Sensors (Basel, Switzerland)|July 28, 2022
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma DiagnosticsSi-Jun Kim, Sang-Ho Lee, Ye-Bin You, et al.
Scientific Reports|December 5, 2022
Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysisSi-Jun Kim, Young-Seok Lee, Chul-Hee Cho, et al.
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