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Environmental Science & Technology|February 18, 2026
Knowledge-Guided Deep Learning Framework for Source Apportionment and Mitigation of Perchlorate Contamination in River BasinsKunting Xie, Lingjun Bu, Jiaxin Xiao, et al.Water Research|October 22, 2021
Organic chloramines formation from algal organic matters: Insights from Fourier transform-ion cyclotron resonance mass spectrometryDa Sheng, Lingjun Bu, Shumin Zhu, et al.Chemosphere|November 10, 2023
Predicting reactivity dynamics of halogen species and trace organic contaminants using machine learning modelsJingyi Zhu, Yuanxi Huang, Qihang Yi, et al.Journal of Hazardous Materials|December 17, 2017
Electrochemical inactivation of Microcystis aeruginosa using BDD electrodes: Kinetic modeling of microcystins release and degradationShiqing Zhou, Lingjun Bu, Zhou Shi, et al.Journal of Hazardous Materials|October 22, 2013
CoFe2O4 magnetic nanoparticles as a highly active heterogeneous catalyst of oxone for the degradation of diclofenac in waterJing Deng, Yisheng Shao, Naiyun Gao, et al.Environmental Science & Technology|March 20, 2026
MXene-Based Nanoconfined Ion Channels for Ultratrace Detection of Short-Chain Per- and Polyfluoroalkyl Substance Trifluoromethanesulfonic Acid and Its On-site ApplicationJiaxin Xiao, Xiaoling Xiong, Yangtao Wu, et al.Journal of Environmental Management|April 13, 2026
Interfacial engineering with nanobubbles to enhance the polymerization transfer pathway for efficient water decontaminationJingyi Zhu, Lingjun Bu, Shuo Zhang, et al.Environmental Science and Ecotechnology|March 18, 2026
Phenolic contaminants generate persistent phenoxyl radicals to accelerate antibiotic degradationLiping Luo, Shiqing Zhou, Jianfei Zhou, et al.Chemosphere|May 19, 2023
Pre-oxidation coupled with charged covalent organic framework membranes for highly efficient removal of organic chloramines precursors in algae-containing water treatmentDa Sheng, Lingjun Bu, Shumin Zhu, et al.Water Research|January 26, 2020
Nitrogen conversion from ammonia to trichloronitromethane: Potential risk during UV/chlorine processShiqing Zhou, Yangtao Wu, Shumin Zhu, et al.Pageof 11