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T J Giammaria

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ACS Applied Materials & Interfaces|November 12, 2014
High aspect ratio PS-b-PMMA block copolymer masks for lithographic applicationsF Ferrarese Lupi, T J Giammaria, F G Volpe, et al.
Nanotechnology|July 16, 2013
Rapid thermal processing of self-assembling block copolymer thin filmsF Ferrarese Lupi, T J Giammaria, M Ceresoli, et al.
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Showing results (1-10 of 2) with videos related to

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Pageof 1
ACS Applied Materials & Interfaces|November 12, 2014
High aspect ratio PS-b-PMMA block copolymer masks for lithographic applicationsF Ferrarese Lupi, T J Giammaria, F G Volpe, et al.
Nanotechnology|July 16, 2013
Rapid thermal processing of self-assembling block copolymer thin filmsF Ferrarese Lupi, T J Giammaria, M Ceresoli, et al.
Pageof 1