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The Journal of Chemical Physics|February 10, 2017
Nucleation and growth mechanisms of Al2O3 atomic layerdeposition on synthetic polycrystalline MoS2H Zhang, D Chiappe, J Meersschaut, et al.
Chemical Communications (Cambridge, England)|September 15, 2015
Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agentsA Delabie, M Caymax, B Groven, et al.
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