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Nature Communications|July 6, 2024
Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assemblyShinsuke Maekawa, Takehiro Seshimo, Takahiro Dazai, et al.
Chemistry of Materials : a Publication of the American Chemical Society|October 26, 2020
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer LithographyDaniel F Sunday, Xuanxuan Chen, Thomas R Albrecht, et al.
ACS Applied Materials & Interfaces|April 19, 2018
Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm FeaturesXuanxuan Chen, Chun Zhou, Shuang-Jun Chen, et al.
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