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Langmuir : the ACS Journal of Surfaces and Colloids|October 10, 2018
1,2-Epoxyalkane: Another Precursor for Fabricating Alkoxy Self-Assembled Monolayers on Hydrogen-Terminated Si(111)Ahmed I A Soliman, Toru Utsunomiya, Takashi Ichii, et al.Langmuir : the ACS Journal of Surfaces and Colloids|February 17, 2018
Vacuum Ultraviolet Treatment of Acid- and Ester-Terminated Self-Assembled Monolayers: Chemical Conversions and Friction ReductionAhmed I A Soliman, Toru Utsunomiya, Takashi Ichii, et al.Langmuir : the ACS Journal of Surfaces and Colloids|September 21, 2017
Immobilization of Reduced Graphene Oxide on Hydrogen-Terminated Silicon Substrate as a Transparent Conductive ProtectorYudi Tu, Toru Utsunomiya, Sho Kokufu, et al.ACS Nano|August 26, 2024
Molecular-Resolution Imaging of Ionic Liquid/Alkali Halide Interfaces with Varied Surface Charge Densities via Atomic Force MicroscopyYifan Bao, Yuto Nishiwaki, Touma Kawano, et al.Journal of Colloid and Interface Science|June 24, 2011
Formation of uniform ferrocenyl-terminated monolayer covalently bonded to Si using reaction of hydrogen-terminated Si(111) surface with vinylferrocene/n-decane solution by visible-light excitationHikaru Sano, Mingxiu Zhao, Daiji Kasahara, et al.Langmuir : the ACS Journal of Surfaces and Colloids|September 22, 2017
Low Damage Reductive Patterning of Oxidized Alkyl Self-Assembled Monolayers through Vacuum Ultraviolet Light Irradiation in an Evacuated EnvironmentAhmed I A Soliman, Yudi Tu, Toru Utsunomiya, et al.Journal of Colloid and Interface Science|July 4, 2012
Covalent assembly of silver nanoparticles on hydrogen-terminated silicon surfaceOm P Khatri, Takashi Ichii, Kuniaki Murase, et al.RSC Advances|May 9, 2022
Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidationCheng-Tse Wu, Ahmed I A Soliman, Toru Utsunomiya, et al.Langmuir : the ACS Journal of Surfaces and Colloids|November 15, 2021
Controlled Growth of Organosilane Micropatterns on Hydrophilic and Hydrophobic Surfaces Templated by Vacuum Ultraviolet PhotolithographyAhmed I A Soliman, Cheng-Tse Wu, Toru Utsunomiya, et al.Langmuir : the ACS Journal of Surfaces and Colloids|April 2, 2009
Alkyl and alkoxyl monolayers directly attached to silicon: chemical durability in aqueous solutionsHikaru Sano, Hajime Maeda, Takashi Ichii, et al.Pageof 3