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Scientific Reports|January 20, 2016
Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minuteTakehiro Seshimo, Rina Maeda, Rin Odashima, et al.
Nature Communications|July 6, 2024
Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assemblyShinsuke Maekawa, Takehiro Seshimo, Takahiro Dazai, et al.
Science (New York, N.Y.)|November 10, 2012
Polarity-switching top coats enable orientation of sub-10-nm block copolymer domainsChristopher M Bates, Takehiro Seshimo, Michael J Maher, et al.
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