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Thiago A de Assis

Showing results (1-10 of 17) with videos related to

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Physical Review. E|November 18, 2025
When orthogonal detrending matters in roughness scalingThiago A de Assis
Nanotechnology|September 27, 2016
Mechanically stable nanostructures with desirable characteristic field enhancement factors: a response from scale invariance in electrostaticsThiago A de Assis, Fernando F Dall'Agnol
Journal of Physics. Condensed Matter : an Institute of Physics Journal|August 11, 2017
Close proximity electrostatic effect from small clusters of emittersFernando F Dall'Agnol, Thiago A de Assis
Journal of Physics. Condensed Matter : an Institute of Physics Journal|April 18, 2018
Evidence of universal inverse-third power law for the shielding-induced fractional decrease in apex field enhancement factor at large spacings: a response via accurate Laplace-type calculationsThiago A de Assis, Fernando F Dall'Agnol
Journal of Physics. Condensed Matter : an Institute of Physics Journal|September 14, 2022
Field emitter electrostatics: a review with special emphasis on modern high-precision finite-element modellingThiago A de Assis, Fernando F Dall'Agnol, Richard G Forbes
Journal of Physics. Condensed Matter : an Institute of Physics Journal|August 7, 2018
Physics-based derivation of a formula for the mutual depolarization of two post-like field emittersFernando F Dall'Agnol, Thiago A de Assis, Richard G Forbes
Physical Review. E|August 20, 2024
Bifractality in the one-dimensional Wolf-Villain modelEdwin E Mozo Luis, Silvio C Ferreira, Thiago A de Assis
Physical Review. E|May 17, 2017
Optimal detrended fluctuation analysis as a tool for the determination of the roughness exponent of the mounded surfacesEdwin E Mozo Luis, Thiago A de Assis, Silvio C Ferreira
Physical Review. E|April 19, 2023
Accessibility of the surface fractal dimension during film growthEdwin E Mozo Luis, Fernando A Oliveira, Thiago A de Assis
Physical Review. E|May 16, 2026
Control of surface roughness by varying the temperature while a thin film is depositedEdwin Edgar Mozo Luis, Thiago A de Assis, Fábio D A Aarão Reis
Pageof 2

Showing results (1-10 of 17) with videos related to

Sort By:
Pageof 2
Physical Review. E|November 18, 2025
When orthogonal detrending matters in roughness scalingThiago A de Assis
Nanotechnology|September 27, 2016
Mechanically stable nanostructures with desirable characteristic field enhancement factors: a response from scale invariance in electrostaticsThiago A de Assis, Fernando F Dall'Agnol
Journal of Physics. Condensed Matter : an Institute of Physics Journal|August 11, 2017
Close proximity electrostatic effect from small clusters of emittersFernando F Dall'Agnol, Thiago A de Assis
Journal of Physics. Condensed Matter : an Institute of Physics Journal|April 18, 2018
Evidence of universal inverse-third power law for the shielding-induced fractional decrease in apex field enhancement factor at large spacings: a response via accurate Laplace-type calculationsThiago A de Assis, Fernando F Dall'Agnol
Journal of Physics. Condensed Matter : an Institute of Physics Journal|September 14, 2022
Field emitter electrostatics: a review with special emphasis on modern high-precision finite-element modellingThiago A de Assis, Fernando F Dall'Agnol, Richard G Forbes
Journal of Physics. Condensed Matter : an Institute of Physics Journal|August 7, 2018
Physics-based derivation of a formula for the mutual depolarization of two post-like field emittersFernando F Dall'Agnol, Thiago A de Assis, Richard G Forbes
Physical Review. E|August 20, 2024
Bifractality in the one-dimensional Wolf-Villain modelEdwin E Mozo Luis, Silvio C Ferreira, Thiago A de Assis
Physical Review. E|May 17, 2017
Optimal detrended fluctuation analysis as a tool for the determination of the roughness exponent of the mounded surfacesEdwin E Mozo Luis, Thiago A de Assis, Silvio C Ferreira
Physical Review. E|April 19, 2023
Accessibility of the surface fractal dimension during film growthEdwin E Mozo Luis, Fernando A Oliveira, Thiago A de Assis
Physical Review. E|May 16, 2026
Control of surface roughness by varying the temperature while a thin film is depositedEdwin Edgar Mozo Luis, Thiago A de Assis, Fábio D A Aarão Reis
Pageof 2