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ACS Omega|April 21, 2025
Spectroscopic Ellipsometry of Plasmonic Gratings-Ideal Parameters for Sensing and Subpicometer Measurement UncertaintyDeshabrato Mukherjee, Sven Burger, Thomas Siefke, et al.Optics Letters|December 10, 2014
Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterningThomas Siefke, Dennis Lehr, Thomas Weber, et al.Optics Express|July 19, 2020
Bound states in the continuum for optomechanical light control with dielectric metasurfacesCarol Bibiana Rojas Hurtado, Johannes Dickmann, Florian Feilong Bruns, et al.Optics Letters|September 29, 2017
175 nm period grating fabricated by i-line proximity mask-aligner lithographyYannick Bourgin, Daniel Voigt, Thomas Käsebier, et al.Optics Express|August 17, 2018
Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyondThomas Siefke, Martin Heusinger, Carol B Rojas Hurtado, et al.Optics Express|July 21, 2015
Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithographyYannick Bourgin, Thomas Siefke, Thomas Käsebier, et al.Optics Express|November 14, 2024
Mid-infrared dielectric laser acceleration in a silicon dual pillar structureLeon Brückner, Tomáš Chlouba, Yuya Morimoto, et al.Optics Letters|June 15, 2019
Mid-infrared long-pass filter for high-power applications based on grating diffractionDaniel Gerz, Wolfgang Schweinberger, Thomas Patrick Butler, et al.The Review of Scientific Instruments|December 8, 2025
Laser-driven high-flux source of coherent quasi-monochromatic extreme ultraviolet radiation for coincidence spectroscopyJulian Späthe, Sebastian Hell, Martin Wünsche, et al.Nanotechnology|May 14, 2025
Characterization and discrimination of periodic nanostructures with scanning-free GEXRFNils Wauschkuhn, Yves Kayser, Jonas Baumann, et al.Pageof 2