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Timo Hatanpää

Showing results (1-10 of 22) with videos related to

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Journal of the American Chemical Society|January 7, 2009
Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and seleniumViljami Pore, Timo Hatanpää, Mikko Ritala, et al.
Dalton Transactions (Cambridge, England : 2003)|May 8, 2010
Study of bismuth alkoxides as possible precursors for ALDTimo Hatanpää, Marko Vehkamäki, Mikko Ritala, et al.
Pharmaceutical Research|October 23, 2010
The use of disaccharides in inhibiting enzymatic activity loss and secondary structure changes in freeze-dried β-galactosidase during storageVille Petteri Heljo, Kirsi Jouppila, Timo Hatanpää, et al.
ACS Omega|November 10, 2025
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and BismuthAnton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, et al.
RSC Advances|May 6, 2022
Submicron fibers as a morphological improvement of amorphous zirconium oxide particles and their utilization in antimonate (Sb(v)) removalSatu Lönnrot, Valtteri Suorsa, Johanna Paajanen, et al.
Dalton Transactions (Cambridge, England : 2003)|October 5, 2021
Highly conductive and stable Co<sub>9</sub>S<sub>8</sub> thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growthMiika Mattinen, Timo Hatanpää, Kenichiro Mizohata, et al.
Dalton Transactions (Cambridge, England : 2003)|July 6, 2022
A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(II) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazineAnton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, et al.
Dalton Transactions (Cambridge, England : 2003)|July 15, 2004
Synthesis and characterisation of cyclopentadienyl complexes of barium: precursors for atomic layer deposition of BaTiO3Timo Hatanpää, Marko Vehkamäki, Ilpo Mutikainen, et al.
ACS Applied Materials & Interfaces|June 13, 2018
Intralanthanide Separation on Layered Titanium(IV) Organophosphate Materials via a Selective Transmetalation ProcessWenzhong Zhang, Sami Hietala, Leonid Khriachtchev, et al.
ACS Materials Au|December 13, 2023
Reductive Thermal Atomic Layer Deposition Process for GoldAnton Vihervaara, Timo Hatanpää, Heta-Elisa Nieminen, et al.
Pageof 3

Showing results (1-10 of 22) with videos related to

Sort By:
Pageof 3
Journal of the American Chemical Society|January 7, 2009
Atomic layer deposition of metal tellurides and selenides using alkylsilyl compounds of tellurium and seleniumViljami Pore, Timo Hatanpää, Mikko Ritala, et al.
Dalton Transactions (Cambridge, England : 2003)|May 8, 2010
Study of bismuth alkoxides as possible precursors for ALDTimo Hatanpää, Marko Vehkamäki, Mikko Ritala, et al.
Pharmaceutical Research|October 23, 2010
The use of disaccharides in inhibiting enzymatic activity loss and secondary structure changes in freeze-dried β-galactosidase during storageVille Petteri Heljo, Kirsi Jouppila, Timo Hatanpää, et al.
ACS Omega|November 10, 2025
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and BismuthAnton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, et al.
RSC Advances|May 6, 2022
Submicron fibers as a morphological improvement of amorphous zirconium oxide particles and their utilization in antimonate (Sb(v)) removalSatu Lönnrot, Valtteri Suorsa, Johanna Paajanen, et al.
Dalton Transactions (Cambridge, England : 2003)|October 5, 2021
Highly conductive and stable Co<sub>9</sub>S<sub>8</sub> thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growthMiika Mattinen, Timo Hatanpää, Kenichiro Mizohata, et al.
Dalton Transactions (Cambridge, England : 2003)|July 6, 2022
A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(II) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazineAnton Vihervaara, Timo Hatanpää, Kenichiro Mizohata, et al.
Dalton Transactions (Cambridge, England : 2003)|July 15, 2004
Synthesis and characterisation of cyclopentadienyl complexes of barium: precursors for atomic layer deposition of BaTiO3Timo Hatanpää, Marko Vehkamäki, Ilpo Mutikainen, et al.
ACS Applied Materials & Interfaces|June 13, 2018
Intralanthanide Separation on Layered Titanium(IV) Organophosphate Materials via a Selective Transmetalation ProcessWenzhong Zhang, Sami Hietala, Leonid Khriachtchev, et al.
ACS Materials Au|December 13, 2023
Reductive Thermal Atomic Layer Deposition Process for GoldAnton Vihervaara, Timo Hatanpää, Heta-Elisa Nieminen, et al.
Pageof 3