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V N Polkovnikov

Showing results (11-20 of 16) with videos related to

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Optics Express|December 23, 2022
Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrorsR M Smertin, N I Chkhalo, M N Drozdov, et al.
Applied Optics|May 3, 2019
Ultrasmooth beryllium substrates for solar astronomy in extreme ultraviolet wavelengthsN I Chkhalo, M S Mikhailenko, A E Pestov, et al.
Applied Optics|July 14, 2016
Reflective Schmidt-Cassegrain system for large-aperture telescopesM N Brychikhin, N I Chkhalo, Ya O Eikhorn, et al.
Optics Express|December 23, 2022
High-aperture EUV microscope using multilayer mirrors and a 3D reconstruction algorithm based on z-tomographyI V Malyshev, D G Reunov, N I Chkhalo, et al.
The Review of Scientific Instruments|July 3, 2020
High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength rangesS A Garakhin, N I Chkhalo, I A Kas'kov, et al.
Optics Express|January 18, 2019
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithographyM V Svechnikov, N I Chkhalo, S A Gusev, et al.
Pageof 2

Showing results (11-20 of 16) with videos related to

Sort By:
Pageof 2
You have reached the last page of results.This site can display upto 16 results.
Optics Express|December 23, 2022
Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrorsR M Smertin, N I Chkhalo, M N Drozdov, et al.
Applied Optics|May 3, 2019
Ultrasmooth beryllium substrates for solar astronomy in extreme ultraviolet wavelengthsN I Chkhalo, M S Mikhailenko, A E Pestov, et al.
Applied Optics|July 14, 2016
Reflective Schmidt-Cassegrain system for large-aperture telescopesM N Brychikhin, N I Chkhalo, Ya O Eikhorn, et al.
Optics Express|December 23, 2022
High-aperture EUV microscope using multilayer mirrors and a 3D reconstruction algorithm based on z-tomographyI V Malyshev, D G Reunov, N I Chkhalo, et al.
The Review of Scientific Instruments|July 3, 2020
High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength rangesS A Garakhin, N I Chkhalo, I A Kas'kov, et al.
Optics Express|January 18, 2019
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithographyM V Svechnikov, N I Chkhalo, S A Gusev, et al.
Pageof 2