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ACS Applied Materials & Interfaces
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August 11, 2025
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, et al.
Analytical Chemistry
|
September 11, 2003
Resonance and nonresonant laser ionization of sputtered uranium atoms from thin films and single microparticles: evaluation of a combined system for particle trace analysis
Nicole Erdmann, Maria Betti, Felix Kollmer, et al.
Applied Optics
|
January 6, 2023
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Qais Saadeh, Philipp Naujok, Meiyi Wu, et al.
Applied Optics
|
March 17, 2022
Determination of optical constants of thin films in the EUV
Richard Ciesielski, Qais Saadeh, Vicky Philipsen, et al.
Page
of 1
Search research articles
Search
Showing results (1-10 of 4) with videos related to
Sort By:
Page
of 1
ACS Applied Materials & Interfaces
|
August 11, 2025
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, et al.
Analytical Chemistry
|
September 11, 2003
Resonance and nonresonant laser ionization of sputtered uranium atoms from thin films and single microparticles: evaluation of a combined system for particle trace analysis
Nicole Erdmann, Maria Betti, Felix Kollmer, et al.
Applied Optics
|
January 6, 2023
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Qais Saadeh, Philipp Naujok, Meiyi Wu, et al.
Applied Optics
|
March 17, 2022
Determination of optical constants of thin films in the EUV
Richard Ciesielski, Qais Saadeh, Vicky Philipsen, et al.
Page
of 1