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Cancer
|
June 15, 1982
Treatment of endometrial carcinoma with radiation therapy alone
O Abayomi, W Tak, B Emami, et al.
International Journal of Radiation Oncology, Biology, Physics
|
September 1, 1980
Para-aortic lymph node radiation in advanced cervical cancer
B Emami, W G Watring, W Tak, et al.
European Journal of Gynaecological Oncology
|
January 1, 1982
Cervical mullerian adenosarcoma: case report
D D Edinger, H Safaii, W Tak, et al.
The European Respiratory Journal
|
September 11, 2009
National income, self-reported wheezing and asthma diagnosis from the World Health Survey
G Sembajwe, M Cifuentes, S W Tak, et al.
Acta Neurologica Scandinavica
|
October 10, 2002
Long-term neuropsychological effects and MRI findings in patients with CS2 poisoning
S K Cho, R H Kim, S H Yim, et al.
Nanotechnology
|
September 17, 2020
Characteristics of silicon nitride deposited by very high frequency (162 MHz)-plasma enhanced atomic layer deposition using bis(diethylamino)silane
J Y Byun, Y J Ji, K H Kim, et al.
Page
of 1
Search research articles
Search
Showing results (1-10 of 6) with videos related to
Sort By:
Page
of 1
Cancer
|
June 15, 1982
Treatment of endometrial carcinoma with radiation therapy alone
O Abayomi, W Tak, B Emami, et al.
International Journal of Radiation Oncology, Biology, Physics
|
September 1, 1980
Para-aortic lymph node radiation in advanced cervical cancer
B Emami, W G Watring, W Tak, et al.
European Journal of Gynaecological Oncology
|
January 1, 1982
Cervical mullerian adenosarcoma: case report
D D Edinger, H Safaii, W Tak, et al.
The European Respiratory Journal
|
September 11, 2009
National income, self-reported wheezing and asthma diagnosis from the World Health Survey
G Sembajwe, M Cifuentes, S W Tak, et al.
Acta Neurologica Scandinavica
|
October 10, 2002
Long-term neuropsychological effects and MRI findings in patients with CS2 poisoning
S K Cho, R H Kim, S H Yim, et al.
Nanotechnology
|
September 17, 2020
Characteristics of silicon nitride deposited by very high frequency (162 MHz)-plasma enhanced atomic layer deposition using bis(diethylamino)silane
J Y Byun, Y J Ji, K H Kim, et al.
Page
of 1