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Materials (Basel, Switzerland)|April 9, 2024
Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina (<i>Al</i><sub>2</sub><i>O</i><sub>3</sub>) AbrasiveJuntao Gong, Weilei Wang, Weili Liu, et al.
Nanomaterials (Basel, Switzerland)|August 28, 2024
Enhancing Slurry Stability and Surface Flatness of Silicon Wafers through Organic Amine-Catalyzed Synthesis Silica SolYi Xing, Weilei Wang, Weili Liu, et al.
Materials (Basel, Switzerland)|July 13, 2024
Correction: Gong et al. Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina (<i>Al</i><sub>2</sub><i>O</i><sub>3</sub>) Abrasive. <i>Materials</i> 2024, <i>17</i>, 679Juntao Gong, Weilei Wang, Weili Liu, et al.
Applied Optics|August 18, 2018
Tunable 360° microwave photonic multichannel phase shifter with frequency quadruplingWeilei Wang, Aijun Wen, Zhaoyang Tu, et al.
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