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William D Hinsberg

Showing results (1-10 of 6) with videos related to

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Analytical Chemistry|January 25, 2002
Determination of the viscoelastic properties of polymer films using a compensated phase-locked oscillator circuitSeok-Won Lee, William D Hinsberg, Kay K Kanazawa
Chemical Reviews|December 3, 2009
Block copolymer based nanostructures: materials, processes, and applications to electronicsHo-Cheol Kim, Sang-Min Park, William D Hinsberg
Physical Chemistry Chemical Physics : PCCP|February 21, 2017
Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosolsAaron A Wiegel, Matthew J Liu, William D Hinsberg, et al.
ACS Nano|August 25, 2010
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresistJoy Y Cheng, Daniel P Sanders, Hoa D Truong, et al.
Nano Letters|October 13, 2005
Oriented mesoporous organosilicate thin filmsErik M Freer, Leslie E Krupp, William D Hinsberg, et al.
The Journal of Chemical Physics|October 22, 2018
Fundamental understanding of chemical processes in extreme ultraviolet resist materialsOleg Kostko, Bo Xu, Musahid Ahmed, et al.
Pageof 1

Showing results (1-10 of 6) with videos related to

Sort By:
Pageof 1
Analytical Chemistry|January 25, 2002
Determination of the viscoelastic properties of polymer films using a compensated phase-locked oscillator circuitSeok-Won Lee, William D Hinsberg, Kay K Kanazawa
Chemical Reviews|December 3, 2009
Block copolymer based nanostructures: materials, processes, and applications to electronicsHo-Cheol Kim, Sang-Min Park, William D Hinsberg
Physical Chemistry Chemical Physics : PCCP|February 21, 2017
Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosolsAaron A Wiegel, Matthew J Liu, William D Hinsberg, et al.
ACS Nano|August 25, 2010
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresistJoy Y Cheng, Daniel P Sanders, Hoa D Truong, et al.
Nano Letters|October 13, 2005
Oriented mesoporous organosilicate thin filmsErik M Freer, Leslie E Krupp, William D Hinsberg, et al.
The Journal of Chemical Physics|October 22, 2018
Fundamental understanding of chemical processes in extreme ultraviolet resist materialsOleg Kostko, Bo Xu, Musahid Ahmed, et al.
Pageof 1