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Wim M J Coene

Showing results (1-10 of 9) with videos related to

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Applied Optics|December 3, 2003
Nonlinear signal-processing model for scalar diffraction in optical recordingWim M J Coene
Applied Optics|August 19, 2007
Scalar diffraction modeling in optical disk recording using wave function assemblingBin Yin, Wim M J Coene, Andries P Hekstra
Applied Optics|September 11, 2019
Automatic feature selection in EUV scatterometryPaolo Ansuinelli, Wim M J Coene, H P Urbach
Applied Optics|July 17, 2020
Improved ptychographic inspection of EUV reticles via inclusion of prior informationPaolo Ansuinelli, Wim M J Coene, H Paul Urbach
Optics Letters|February 20, 2004
Nonlinear signal-processing model for signal generation in multilevel two-dimensional optical storageLina Fagoonee, Wim M J Coene, Abdolhosein Moinian, et al.
Ultramicroscopy|July 9, 2021
Parameter retrieval of small particles in dark-field Fourier ptychography and a rectangle in real-space ptychographyXukang Wei, H Paul Urbach, Peter van der Walle, et al.
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 4, 2016
Fast semi-analytical solution of Maxwell's equations in Born approximation for periodic structuresMaxim Pisarenco, Richard Quintanilha, Mark G M M van Kraaij, et al.
Optics Express|October 17, 2014
Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometryNitish Kumar, Peter Petrik, Gopika K P Ramanandan, et al.
Applied Optics|May 3, 2014
Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratingsSven van Haver, Wim M J Coene, Koen D'havé, et al.
Pageof 1

Showing results (1-10 of 9) with videos related to

Sort By:
Pageof 1
Applied Optics|December 3, 2003
Nonlinear signal-processing model for scalar diffraction in optical recordingWim M J Coene
Applied Optics|August 19, 2007
Scalar diffraction modeling in optical disk recording using wave function assemblingBin Yin, Wim M J Coene, Andries P Hekstra
Applied Optics|September 11, 2019
Automatic feature selection in EUV scatterometryPaolo Ansuinelli, Wim M J Coene, H P Urbach
Applied Optics|July 17, 2020
Improved ptychographic inspection of EUV reticles via inclusion of prior informationPaolo Ansuinelli, Wim M J Coene, H Paul Urbach
Optics Letters|February 20, 2004
Nonlinear signal-processing model for signal generation in multilevel two-dimensional optical storageLina Fagoonee, Wim M J Coene, Abdolhosein Moinian, et al.
Ultramicroscopy|July 9, 2021
Parameter retrieval of small particles in dark-field Fourier ptychography and a rectangle in real-space ptychographyXukang Wei, H Paul Urbach, Peter van der Walle, et al.
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 4, 2016
Fast semi-analytical solution of Maxwell's equations in Born approximation for periodic structuresMaxim Pisarenco, Richard Quintanilha, Mark G M M van Kraaij, et al.
Optics Express|October 17, 2014
Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometryNitish Kumar, Peter Petrik, Gopika K P Ramanandan, et al.
Applied Optics|May 3, 2014
Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratingsSven van Haver, Wim M J Coene, Koen D'havé, et al.
Pageof 1