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Applied Optics|January 25, 2012
Shape correction of optical surfaces using plasma chemical vaporization machining with a hemispherical tip electrodeHideo Takino, Kazuya Yamamura, Yasuhisa Sano, et al.Applied Optics|August 11, 2010
Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabricationHideo Takino, Kazuya Yamamura, Yasuhisa Sano, et al.Applied Optics|February 4, 2017
Simulation of concave-convex imaging mirror system for development of a compact and achromatic full-field x-ray microscopeJumpei Yamada, Satoshi Matsuyama, Yasuhisa Sano, et al.The Review of Scientific Instruments|October 3, 2015
Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective opticsJumpei Yamada, Satoshi Matsuyama, Yasuhisa Sano, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Evaluation of Schottky barrier diodes fabricated directly on processed 4H-SiC(0001) surfacesYasuhisa Sano, Yuki Shirasawa, Takeshi Okamoto, et al.The Review of Scientific Instruments|September 4, 2007
Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machiningYasuhisa Sano, Kazuya Yamamura, Hidekazu Mimura, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Electroforming for replicating nanometer-level smooth surfaceHidekazu Mimura, Hiroyuki Ishikura, Satoshi Matsuyama, et al.Journal of Physics. Condensed Matter : an Institute of Physics Journal|September 17, 2011
Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparationsKenta Arima, Katsuyoshi Endo, Kazuto Yamauchi, et al.The Review of Scientific Instruments|January 4, 2024
High-precision finishing method for narrow-groove channel-cut crystal x-ray monochromator using plasma chemical vaporization machining with wire electrodeShotaro Matsumura, Iori Ogasahara, Taito Osaka, et al.The Review of Scientific Instruments|May 3, 2020
An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical platingDaisetsu Toh, Pho Van Bui, Ai Isohashi, et al.Pageof 5