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Yinye Ding

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Micromachines|January 8, 2025
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint LithographyFeifan Xu, Yinye Ding, Wenhao Chen, et al.
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Showing results (1-10 of 1) with videos related to

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Pageof 1
Micromachines|January 8, 2025
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint LithographyFeifan Xu, Yinye Ding, Wenhao Chen, et al.
Pageof 1