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Small (Weinheim an Der Bergstrasse, Germany)|January 6, 2026
p-Block Tin Single-Atom Catalysts with Tuned p-Orbital State for Oxygen Reduction ReactionXiangyu Fu, Qiuyan Wang, Menglin Zhang, et al.
ACS Applied Materials & Interfaces|May 21, 2021
Fe-Al-Si Thermoelectric (FAST) Materials and Modules: Diffusion Couple and Machine-Learning-Assisted Materials DevelopmentYoshiki Takagiwa, Zhufeng Hou, Koji Tsuda, et al.
Journal of the American Chemical Society|November 7, 2024
Mitigating Band Tailing in Kesterite Solar Absorbers: Ab Initio Quantum DynamicsPingzhi Zhang, Elizabeth Stippell, Zhufeng Hou, et al.
Scientific Data|February 19, 2020
Author Correction: Physical and chemical descriptors for predicting interfacial thermal resistanceYen-Ju Wu, Tianzhuo Zhan, Zhufeng Hou, et al.
The Journal of Physical Chemistry Letters|July 4, 2018
Influence of Encapsulated Water on Luminescence Energy, Line Width, and Lifetime of Carbon Nanotubes: Time Domain Ab Initio AnalysisWei Li, Run Long, Zhufeng Hou, et al.
Scientific Data|February 5, 2020
Physical and chemical descriptors for predicting interfacial thermal resistanceYen-Ju Wu, Tianzhuo Zhan, Zhufeng Hou, et al.
Journal of the American Chemical Society|September 14, 2014
Active sites and mechanisms for oxygen reduction reaction on nitrogen-doped carbon alloy catalysts: Stone-Wales defect and curvature effectGuo-Liang Chai, Zhufeng Hou, Da-Jun Shu, et al.
Journal of Colloid and Interface Science|February 6, 2021
Theoretical screening of VSe<sub>2</sub> as support for enhanced electrocatalytic performance of transition-metal single atomsYanwei Wang, Jin Wan, Wu Tian, et al.
Journal of Chemical Theory and Computation|November 7, 2024
Machine Learning Model for the Prediction of Hubbard <i>U</i> Parameters and Its Application to Fe-O SystemsWenming Xia, Guo Chen, Yuanqin Zhu, et al.
The Journal of Physical Chemistry. A|December 29, 2012
Theoretical characterization of X-ray absorption, emission, and photoelectron spectra of nitrogen doped along graphene edgesXianlong Wang, Zhufeng Hou, Takashi Ikeda, et al.
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