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Science and Technology of Advanced Materials|May 10, 2021
Global snapshot of the effects of the COVID-19 pandemic on the research activities of materials scientists between Spring and Autumn 2020Adarsh Sandhu, Roland Hany, Atsufumi Hirohata, et al.
Science and Technology of Advanced Materials|June 4, 2020
Effect of Ni, W and Mo on the microstructure, phases and high-temperature sliding wear performance of CoCr matrix alloysGongjun Cui, Huiqiang Liu, Sai Li, et al.
Science and Technology of Advanced Materials|August 4, 2021
Environmentally friendly recycling system for epoxy resin with dynamic covalent bondingHsing-Ying Tsai, Takehiro Fujita, Siqian Wang, et al.
Science and Technology of Advanced Materials|July 3, 2025
High thermoelectric performance of p-type Fe2V0.8Mn0.2Al Heusler alloy thin films grown on insulating oxide substratesRajveer Jha, Naohito Tsujii, Alexander Riss, et al.
Science and Technology of Advanced Materials|July 2, 2025
Sum rules for X-ray circular and linear dichroism based on complete magnetic multipole basisY Yamasaki, Y Ishii, N Sasabe
Science and Technology of Advanced Materials|June 23, 2025
Design of open systems for meniscus splitting demonstrated using an aqueous polymer solutionReina Hagiwara, Kosuke Okeyoshi
Science and Technology of Advanced Materials|December 18, 2025
Isomerization of spiropyran photoswitches in microphase-separated block copolymersKeiichi Imato, Koki Momota, Ichiro Imae, et al.
Science and Technology of Advanced Materials|December 18, 2025
Thermal spin transport phenomena and their correlation to magnetic properties of metallic Pt/Co1-xFex and Pt/Ni1-xFex bilayersPanagiota Bougiatioti, Orestis Manos, Günter Reiss, et al.
Science and Technology of Advanced Materials|December 24, 2025
Review of recent developments in capacitor-type heat flow switching devicesKeisuke Hirata, Tsunehiro Takeuchi
Science and Technology of Advanced Materials|December 16, 2024
Enhancement of the thermoelectric figure of merit in the Dirac semimetal Cd3As2 by band-structure and -filling controlMarkus Kriener, Takashi Koretsune, Ryotaro Arita, et al.
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