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The Journal of Chemical Physics|November 25, 2010
Theoretical analysis of initial adsorption of high-κ metal oxides on In(x)Ga(1-x)As(0 0 1)-(4×2) surfacesSarah R Bishop, Jonathon B Clemens, Evgueni A Chagarov, et al.The Journal of Chemical Physics|November 25, 2010
Formation of undulated lamellar structure from ABC block terpolymer blends with different chain lengthsYushu Matsushita, Jiro Suzuki, Yuuki Izumi, et al.The Journal of Chemical Physics|November 25, 2010
Stochastic theory of large-scale enzyme-reaction networks: finite copy number corrections to rate equation modelsPhilipp Thomas, Arthur V Straube, Ramon GrimaThe Journal of Chemical Physics|December 29, 2010
The polarizable point dipoles method with electrostatic damping: implementation on a model systemJonàs Sala, Elvira Guàrdia, Marco MasiaThe Journal of Chemical Physics|December 29, 2010
Exact quantum statistics for electronically nonadiabatic systems using continuous path variablesNandini Ananth, Thomas F MillerThe Journal of Chemical Physics|December 29, 2010
The renormalized Jellium model of colloidal suspensions with multivalent counterionsThiago E Colla, Yan LevinThe Journal of Chemical Physics|December 29, 2010
Algorithmic differentiation and the calculation of forces by quantum Monte CarloSandro Sorella, Luca CapriottiThe Journal of Chemical Physics|December 29, 2010
Rotational dependence of the proton-transfer reaction HBr+ + CO2 → HOCO+ + Br. II. Comparison of HBr+ (2Π(3/2)) and HBr+ (2Π(1/2))Lisa Paetow, Franziska Unger, Bernd Beutel, et al.The Journal of Chemical Physics|December 29, 2010
Recombination-pumped triatomic hydrogen infrared lasersR J Saykally, E A Michael, J Wang, et al.The Journal of Chemical Physics|December 29, 2010
Kinetics following addition of sulfur fluorides to a weakly ionized plasma from 300 to 500 K: rate constants and product determinations for ion-ion mutual neutralization and thermal electron attachment to SF5, SF3, and SF2Nicholas S Shuman, Thomas M Miller, Nilay Hazari, et al.Pageof 5,296