Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

David S Simons

3PUBLICATIONS
6CO-AUTHORS
Nonlinear optics and spectroscopyElemental semiconductorsInstruments and techniques
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Journal

Publications (3)

Sort by Publication Date:
|Dec 29, 2022
Improved Uranium Particle Analysis by SIMS using O<sub>3</sub> <sup>-</sup> Primary Ions.

Evan E Groopman, Todd L Williamson, David S Simons

|Oct 12, 2020
Targeted enrichment of <sup>28</sup>Si thin films for quantum computing.

K Tang, H S Kim, A N Ramanayaka

|Jun 15, 2019
Advances in age-dating of individual uranium particles by large geometry secondary ion mass spectrometry.

Christopher Szakal, David S Simons, John D Fassett

Pageof 1

Frequent Collaborators

1 joint publications

K Tang

1 joint publications

A N Ramanayaka

1 joint publications

J M Pomeroy

1 joint publications

Christopher Szakal

1 joint publications

Evan E Groopman

1 joint publications

Todd L Williamson

Frequent Collaborators

1 joint publications

K Tang

1 joint publications

A N Ramanayaka

1 joint publications

J M Pomeroy

1 joint publications

Christopher Szakal

Top Related Videos

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on : Feb 21, 2019

8.1K
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on : Jun 03, 2015

15.2K
Imaging Corrosion at the Metal-Paint Interface Using Time-of-Flight Secondary Ion Mass Spectrometry
07:24

Imaging Corrosion at the Metal-Paint Interface Using Time-of-Flight Secondary Ion Mass Spectrometry

Published on : May 06, 2019

8.7K
See more related videos

Top Related Videos

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on : Feb 21, 2019

8.1K
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on : Jun 03, 2015

15.2K
Imaging Corrosion at the Metal-Paint Interface Using Time-of-Flight Secondary Ion Mass Spectrometry
07:24

Imaging Corrosion at the Metal-Paint Interface Using Time-of-Flight Secondary Ion Mass Spectrometry

Published on : May 06, 2019

8.7K
See more related videos