Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Rodney D Hunt

1PUBLICATIONS
6CO-AUTHORS
Particle and high energy physics not elsewhere classified
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Journal

Publications (1)

Sort by Publication Date:
|Sep 23, 2024
Comment on 'Resonant inelastic x-ray scattering from U<sub>3</sub>O<sub>8</sub>and UN'.

Andrew Miskowiec, Tyler Spano, Z E Brubaker

Pageof 1

Frequent Collaborators

1 joint publications

Andrew Miskowiec

1 joint publications

Tyler Spano

1 joint publications

Z E Brubaker

1 joint publications

J L Niedziela

1 joint publications

D L Abernathy

1 joint publications

S Finkeldei

Frequent Collaborators

1 joint publications

Andrew Miskowiec

1 joint publications

Tyler Spano

1 joint publications

Z E Brubaker

1 joint publications

J L Niedziela

Top Related Videos

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on : Feb 21, 2019

8.0K
See more related videos

Top Related Videos

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
12:05

U<sub>2</sub>O<sub>5</sub> Film Preparation via UO<sub>2 </sub>Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on : Feb 21, 2019

8.0K
See more related videos